- All sections
- G - Physics
- G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; materials therefor; originals therefor; apparatus specially adapted therefor
- G03F 1/20 - Masks or mask blanks for imaging by charged particle beam [CPB] radiation, e.g. by electron beam; Preparation thereof
Patent holdings for IPC class G03F 1/20
Total number of patents in this class: 148
10-year publication summary
14
|
17
|
17
|
12
|
9
|
6
|
5
|
4
|
4
|
3
|
2015 | 2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 |
Principal owners for this class
Owner |
All patents
|
This class
|
---|---|---|
D2s, Inc. | 150 |
36 |
Taiwan Semiconductor Manufacturing Company, Ltd. | 36809 |
16 |
Hoya Corporation | 2822 |
10 |
Shin-Etsu Chemical Co., Ltd. | 5132 |
8 |
Samsung Electronics Co., Ltd. | 131630 |
6 |
FUJIFILM Corporation | 27102 |
6 |
Samsung Display Co., Ltd. | 30585 |
3 |
DTS, Inc. | 381 |
3 |
Nippon Control System Corporation | 18 |
3 |
Intel Corporation | 45621 |
2 |
Applied Materials, Inc. | 16587 |
2 |
Tokyo Electron Limited | 11599 |
2 |
Advantest Corporation | 1939 |
2 |
KLA-Tencor Corporation | 2574 |
2 |
NuFlare Technology, Inc. | 770 |
2 |
Tokyo Ohka Kogyo Co., Ltd. | 1481 |
2 |
3m Innovative Properties Company | 18406 |
1 |
LG Display Co., Ltd. | 11907 |
1 |
The Regents of the University of California | 18943 |
1 |
International Business Machines Corporation | 60644 |
1 |
Other owners | 39 |